Estudio de espesor para resinas AZ-1518 y AZ-nLOF2035 a partir de medidas ópticas multi-interfaz mediante elipsometría espectral

Abstract

The microlithographic process for circuits with photosensitive resins requires understanding their behavior under laboratory conditions, as the layer thickness depends on the viscosity, liquid density, and rotation speed. This study focuses on the resins AZ-1518 and AZ-nLOF2035, using the spin-coating method, which ensures uniform deposition without tangential forces. It is essential to establish a specific calibration curve for laboratory conditions, as the curves provided by manufacturers may not fit these conditions. Spectral ellipsometry is the experimental technique used to characterize the samples, allowing for the measurement of optical constants and the determination of layer thickness. Through the New Amorphous model, a fit with remarkable statistical goodness is achieved, adapting to various environmental conditions. The research seeks to relate the layer thickness to the centrifuge revolutions to optimize the lithographic process.